✦ LIBER ✦

Deposition of Mo Oxide and Metallic Mo Films by Chemical Vapor Transport of MoO3(OH)2

✍ Scribed by Young Jung Lee; Young Ik Seo; Se Hoon Kim; Dae-Gun Kim; Young Do Kim

Publisher: John Wiley and Sons
Year: 2009
Tongue: English
Weight: 728 KB
Volume: 15
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200906738

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

ChemInform Abstract: Chemical Vapor Depo

ChemInform Abstract: Chemical Vapor Deposition of MoS2 and TiS2 Films from the Metal- Organic Precursors Mo(S-tBu)4 and Ti(S-tBu)4.

✍ J. CHEON; J. E. GOZUM; G. S. GIROLAMI 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 29 KB 👁 2 views

Chemical Vapor Deposition of MoS2 and TiS2 Films from the Metal-Organic Precursors Mo(S-tBu)4 and Ti(S-tBu)4. -The formation of thin MoS2 and TiS2 films by MOCVD from the title precursors is studied and the decomposition mechanism is described. Amorphous films with low levels of oxygen and carbon co

Metal—Organic Chemical Vapor Deposition

Metal—Organic Chemical Vapor Deposition Synthesis of Hollow Inorganic-Fullerene-Type MoS2 and MoSe2 Nanoparticles.

✍ Johannes Etzkorn; Helen A. Therese; Frank Rocker; Nicole Zink; Ute Kolb; Wolfgan 📂 Article 📅 2005 🏛 John Wiley and Sons ⚖ 9 KB

## Abstract For Abstract see ChemInform Abstract in Full Text.

ChemInform Abstract: Analysis of (Cr,Mo)

ChemInform Abstract: Analysis of (Cr,Mo) Oxycarbide Films Grown on Stainless Steel via Metalloorganic Chemical Vapor Deposition.

✍ M.-H. LO; W.-C. J. WEI 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 30 KB 👁 2 views

ChemInform Abstract: Deposition of Elect

ChemInform Abstract: Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma- Enhanced Chemical Vapor Deposition.

✍ W. B. HENLEY; G. J. SACKS 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 27 KB 👁 2 views

ChemInform Abstract: Deposition of Thin

ChemInform Abstract: Deposition of Thin Films of Gallium Sulfide from a Novel Single-Source Precursor, Ga(S2CNMeHex)3, by Low-Pressure Metal—Organic Chemical Vapor Deposition.

✍ Mike R. Lazell; Paul O'Brien; David J. Otway; Jin-Ho Park 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 36 KB 👁 2 views

Low pressure chemical vapor deposition o

Low pressure chemical vapor deposition of metallic films of iron, manganese, cobalt, copper, germanium and tin employing bis(trimethyl)silylamido complexes, M(N(SiMe3)2)n

✍ Prof. David V. Baxter; Prof. Malcolm H. Chisholm; Dr. Gennaro J. Gama; Andrew L. 📂 Article 📅 1995 🏛 John Wiley and Sons 🌐 English ⚖ 461 KB 👁 2 views