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Low pressure chemical vapor deposition of metallic films of iron, manganese, cobalt, copper, germanium and tin employing bis(trimethyl)silylamido complexes, M(N(SiMe3)2)n

✍ Scribed by Prof. David V. Baxter; Prof. Malcolm H. Chisholm; Dr. Gennaro J. Gama; Andrew L. Hector; Dr. Ivan P. Parkin


Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
461 KB
Volume
1
Category
Article
ISSN
0948-1907

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