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Deposition of Fluoropolymer Films on Si(100) Surfaces by Rf Magnetron Sputtering of Poly(tetrafluoroethylene)

โœ Scribed by Zhang, Yan; Yang, G. H.; Kang, E. T.; Neoh, K. G.; Huang, Wei; Huan, A. C. H.; Wu, S. Y.


Book ID
125519723
Publisher
American Chemical Society
Year
2002
Tongue
English
Weight
156 KB
Volume
18
Category
Article
ISSN
0743-7463

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Ag nanostructures on TiO 2 films were deposited by RF magnetron sputtering under variable deposition parameters, such as DC potential, RF-power and total pressure. The concentration, shape, and distribution of the deposited nanostructures and continuous Ag films on thin films of TiO 2 can be tailore