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Deposition and characterization of BN/Si(0 0 1) using tris(dimethylamino)borane

✍ Scribed by Hervé Dumont; Béatrice Bayle; Bernard Bonnetot; Jean Bouix


Book ID
114066142
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
188 KB
Volume
37
Category
Article
ISSN
0025-5408

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Aluminum nitride (AlN) thin films have been deposited on Si(1 1 1) substrates by using reactive-rf-magnetron-sputtering at 250 °C. The crystalline quality and orientation of the films have been studied by X-ray diffraction (XRD). We have observed that the films grow with c-or a-axis orientation. The