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Deposition of titanium nitride on Si(1 0 0) wafers using plasma focus

โœ Scribed by Tousif Hussain; R. Ahmad; I.A. Khan; Jamil Siddiqui; Nida Khalid; Arshad Saleem Bhatti; Shahzad Naseem


Book ID
108224444
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
638 KB
Volume
267
Category
Article
ISSN
0168-583X

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Laser ablation of a high purity (99.7%) iron target was used to accomplish the depositions of iron nanoparticles on the (0 0 0 1) face of single crystal sapphire wafers. The nanoparticles were characterized in situ by means of X-ray photoelectron spectroscopy (XPS). The growth mechanism was determin