𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Defect analysis in thermal nanoimprint lithography

✍ Scribed by Hirai, Yoshihiko; Yoshida, Satoshi; Takagi, Nobuyuki

Book ID
120520160
Publisher
AVS (American Vacuum Society)
Year
2003
Tongue
English
Weight
787 KB
Volume
21
Category
Article
ISSN
0734-211X

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Study of the behaviour of monomers in th
Study of the behaviour of monomers in thermal nanoimprint lithography
✍ C. Gourgon; A. BΓ©duer; S. Landis; C. Perret; N. Chaix; I. Gereige πŸ“‚ Article πŸ“… 2010 πŸ› Elsevier Science 🌐 English βš– 392 KB

Thermoplastics are commonly used in thermal nanoimprint lithography (NIL) but their high viscosity leads to inhomogeneities of residual thickness in patterns with various densities. Monomers exhibit low viscosity and are imprinted easily and polymerized with UV-NIL processes. These monomers can be a