Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks

✍ Scribed by W.J. Dauksher; S.B. Clemens; D.J. Resnick; K.H. Smith; P.J.S. Mangat; S. Rauf; P.L.G. Ventzek; V. Arunachalam; B.N. Ramamurthi; H. Ashraf; L. Lea; S. Hall; I.R. Johnston; J. Hopkins; J.K. Bhardwaj

• Book ID: 114155344
• Publisher: Elsevier Science
• Year: 2001
• Tongue: English
• Weight: 144 KB
• Volume: 57-58
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(01)00550-0