Modeling and experimental data using a new high rate ICP tool for dry etching 200 mm EPL masks

✍ Scribed by W.J. Dauksher; S.B. Clemens; D.J. Resnick; K.H. Smith; P.J.S. Mangat; S. Rauf; P. Stout; P.L.G. Ventzek; H. Ashraf; L. Lea; S. Hall; J. Hopkins; A. Chambers

• Book ID: 114155474
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 478 KB
• Volume: 61-62
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(02)00568-3