SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Micromachining and Microfabrication Process Technology II - High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors

✍ Scribed by Pandhumsoporn, Tam; Feldbaum, Michael; Gadgil, Prashant; Puech, Michel; Maquin, Philippe; Pang, Stella W.; Chang, Shih-Chia

• Book ID: 120929970
• Publisher: SPIE
• Year: 1996
• Weight: 486 KB
• Volume: 2879
• Category: Article
• DOI: 10.1117/12.251235