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SPIE Proceedings [SPIE Micromachining and Microfabrication '96 - Austin, TX (Monday 14 October 1996)] Micromachining and Microfabrication Process Technology II - High-etch-rate anisotropic deep silicon plasma etching for the fabrication of microsensors

โœ Scribed by Pandhumsoporn, Tam; Feldbaum, Michael; Gadgil, Prashant; Puech, Michel; Maquin, Philippe; Pang, Stella W.; Chang, Shih-Chia


Book ID
120929970
Publisher
SPIE
Year
1996
Weight
486 KB
Volume
2879
Category
Article

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