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SU8 photoresist as an etch mask for local deep anodic etching of silicon

✍ Scribed by Starkov, V. V. ;Gavrilin, E. Yu. ;Konle, J. ;Presting, H. ;Vyatkin, A. F. ;König, U.


Book ID
105362325
Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
835 KB
Volume
197
Category
Article
ISSN
0031-8965

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