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Cypress and Silecs co-develop low-k materials


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
237 KB
Volume
17
Category
Article
ISSN
0961-1290

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Evaluating k-values for low-k materials
✍ B. Vereecke; M. Pantouvaki; I. Ciofi; G.P. Beyer; Zs. TΓΆkei πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 734 KB

This work discusses a method for measuring k-values of low-k films after integration in damascene structures. The experimental results are obtained from 90 nm Β½ pitch single damascene structures on low-k materials with intrinsic k-values ranging between 2.2 and 3. The measurement technique is discus