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Evaluating k-values for low-k materials after damascene integration: Method and results

✍ Scribed by B. Vereecke; M. Pantouvaki; I. Ciofi; G.P. Beyer; Zs. Tökei


Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
734 KB
Volume
88
Category
Article
ISSN
0167-9317

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✦ Synopsis


This work discusses a method for measuring k-values of low-k films after integration in damascene structures. The experimental results are obtained from 90 nm ½ pitch single damascene structures on low-k materials with intrinsic k-values ranging between 2.2 and 3. The measurement technique is discussed in detail with a focus on the accuracy, limitation of the method, impact of low-k damage and applicability for smaller dimensions.


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