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Characterizing high-k and low-k dielectric materials for semiconductors: Progress and challenges

✍ Scribed by J. Bennett; M. Quevedo-Lopez; S. Satyanarayana

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 342 KB
Volume: 252
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.02.087

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## Abstract This paper shows how the dielectric constant of alumina and rutile substrates at microwave frequencies can be accurately determined by fitting the simulated __S__‐parameter spectra of microstrip ring resonators, generated __via__ the finite‐difference time‐domain (FDTD) method, to exper