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Crystallization behavior and mechanical properties of erbium oxide coatings fabricated by pulsed magnetron sputtering

✍ Scribed by Xinlian Li; Ping Wu; Hong Qiu; Sen Chen; Binbin Song

Book ID
113937293
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
842 KB
Volume
520
Category
Article
ISSN
0040-6090

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Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si