Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si
✦ LIBER ✦
Microstructure, mechanical and tribological properties of Cr–C–N coatings deposited by pulsed closed field unbalanced magnetron sputtering
✍ Scribed by Z.L. Wu; J. Lin; J.J. Moore; M.K. Lei
- Book ID
- 108278559
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 432 KB
- Volume
- 204
- Category
- Article
- ISSN
- 0257-8972
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