Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si
Microstructure and mechanical properties of Cr–N coatings by ion-beam-assisted magnetron sputtering
✍ Scribed by Linhai Tian; Xiaodong Zhu; Bin Tang; Junde Pan; Jiawen He
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 406 KB
- Volume
- 483-484
- Category
- Article
- ISSN
- 0921-5093
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