Control of junction resistances in molecular electronic devices fabricated by FIB
✍ Scribed by S. Hassan M. Jafri; Tobias Blom; Andreas Wallner; Ken Welch; Maria Strømme; Henrik Ottosson; Klaus Leifer
- Book ID
- 104052794
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 486 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0167-9317
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The fabrication of high-aspect-ratio submicron-to-nanometer range microstructures in LiNbO using a state-of-the-art Schlum-3 ( ) berger AMS 3000 focused ion-beam FIB system is presented. The submicron structures with about 350 nm width and 1600 nm depth are fabricated by employing XeF gas-assisted g