Contact Resistance Reduction Technology Using Selenium Segregation for N-MOSFETs With Silicon–Carbon Source/Drain

✍ Scribed by Hoong-Shing Wong; Kah-Wee Ang; Lap Chan; Samudra, G.; Yeo, Y.-C.

• Book ID: 114619612
• Publisher: IEEE
• Year: 2009
• Tongue: English
• Weight: 887 KB
• Volume: 56
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/ted.2009.2016143