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Composition and Surface Properties of a Silicon Dioxide Film Deposited by a Plasma-Chemical Technique

✍ Scribed by V. M. Izgorodin; Yu. V. Tolokonnikov; A. A. Aushev; A. F. Kovylov; N. L. Zolotukhina

Book ID: 110403466
Publisher: SP MAIK Nauka/Interperiodica
Year: 2002
Tongue: English
Weight: 149 KB
Volume: 36
Category: Article
ISSN: 0018-1439
DOI: 10.1023/a:1021082927058

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