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Compositional, optoelectronic and structural properties of amorphous silicon-nitrogen alloys deposited by plasma enhanced chemical vapor deposition

✍ Scribed by F. Giorgis; P. Rava; R. Galloni; R. Rizzoli; C. Summonte; G. Crovini; F. Demichelis; C.F. Pirri; E. Tresso; V. Rigato

No coin nor oath required. For personal study only.

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