✦ LIBER ✦

Complete plasma physics, plasma chemistry, and surface chemistry simulation of SiO2 and Si etching in CF4 plasmas

✍ Scribed by E. Gogolides; P. Vauvert; A. Rhallabi; G. Turban

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Problems of surface morphology and layer

✍ Dr. H.-J. Tiller; J. Krausse 📂 Article 📅 1982 🏛 John Wiley and Sons 🌐 English ⚖ 379 KB

Problems of Surface Morphology and Layer

✍ H.-J. Tiller; J. Krausse; R. Voigt 📂 Article 📅 1982 🏛 John Wiley and Sons 🌐 English ⚖ 355 KB

In situ Auger electron spectroscopy of S

📂 Article 📅 1980 🏛 Elsevier Science 🌐 English ⚖ 158 KB

Control of relative etch rates of SiO2 a

✍ Rudolf A.H. Heinecke 📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 148 KB

Etching Efficiency for Si and SiO2 by CF

✍ T. Yamaguchi; K. Sasaki; K. Kadota 📂 Article 📅 2000 🏛 Springer 🌐 English ⚖ 164 KB

A comparative study of CH4and CF4rf disc

✍ Nikolaos V. Mantzaris; Evangelos Gogolides; Andreas G. Boudouvis 📂 Article 📅 1996 🏛 Springer 🌐 English ⚖ 1016 KB