✦ LIBER ✦
Etching Efficiency for Si and SiO2 by CF+x, F+, and C+ Ion Beams Extracted from CF4 Plasmas
✍ Scribed by T. Yamaguchi; K. Sasaki; K. Kadota
- Book ID
- 110243983
- Publisher
- Springer
- Year
- 2000
- Tongue
- English
- Weight
- 164 KB
- Volume
- 20
- Category
- Article
- ISSN
- 0272-4324
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