๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Competitive growth mechanisms of aluminum nitride thin films deposited by off-normal reactive magnetron sputtering

โœ Scribed by Deniz, D.; Karabacak, T.; Harper, J. M. E.


Book ID
120278680
Publisher
American Institute of Physics
Year
2008
Tongue
English
Weight
578 KB
Volume
103
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Mechanical properties of amorphous carbo
โœ Dong Li; Yip-Wah Chung; Ming-Show Wong; William D. Sproul ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Springer US ๐ŸŒ English โš– 379 KB

Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partia