𝔖 Bobbio Scriptorium

✦ LIBER ✦

Comparison of models for the calculation of ion implantation moments of implanted boron, phosphorus and arsenic dopants in thin film silicides

✍ Scribed by P.D. Cole; G.M. Crean; J. Lorenz; L. Dupas

Book ID: 113282481
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 552 KB
Volume: 55
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(91)96275-p

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Range distributions of ion implanted bor

Range distributions of ion implanted boron, phosphorus and arsenic dopants in thermally reacted titanium silicide thin films

✍ G.M. Crean; P.D. Cole; C. Jeynes 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 276 KB

Diffusion of boron, phosphorus and arsen

Diffusion of boron, phosphorus and arsenic implanted in thin films of cobalt disilicide: O Thomas et al, J Vac Sci Technol, A6, 1988, 1736–1739

📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 153 KB

Comparison of Monte Carlo simulations an

Comparison of Monte Carlo simulations and analytical models for the calculation of implantation profiles in multilayer targets

✍ Heiner Ryssel; Wolfgang Krüger; Jürgen Lorenz 📂 Article 📅 1987 🏛 Elsevier Science 🌐 English ⚖ 279 KB

[IEEE 2013 Transducers & Eurosensors XXV

[IEEE 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII) - Barcelona, Spain (2013.06.16-2013.06.20)] 2013 Transducers & Eurosensors XXVII: The 17th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS & EUROSENSORS XXVII) - Investigation of boron and nitrogen ion beam implantation in gold thin films for ohmic MEMS switch contact improvement

✍ Arrazat, B.; Inal, K.; Gergaud, P. 📂 Article 📅 2013 🏛 IEEE ⚖ 754 KB