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Diffusion of boron, phosphorus and arsenic implanted in thin films of cobalt disilicide: O Thomas et al, J Vac Sci Technol, A6, 1988, 1736–1739

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 153 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90937-8

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