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Range distributions of ion implanted boron, phosphorus and arsenic dopants in thermally reacted titanium silicide thin films

✍ Scribed by G.M. Crean; P.D. Cole; C. Jeynes


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
276 KB
Volume
33
Category
Article
ISSN
0038-1101

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