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Comparative study of ion implantation caused anomalous surface damage in silicon studied by spectroscopic ellipsometry and Rutherford backscattering spectrometry

✍ Scribed by T Lohner; M Fried; N.Q Khánh; P Petrik; H Wormeester; M.A El-Sherbiny


Book ID
114170566
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
188 KB
Volume
147
Category
Article
ISSN
0168-583X

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