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Ion implantation-caused damage depth profiles in single-crystalline silicon studied by Spectroscopic Ellipsometry and Rutherford Backscattering Spectrometry

✍ Scribed by P Petrik; O Polgár; T Lohner; M Fried; NQ Khánh; J Gyulai


Book ID
108390406
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
961 KB
Volume
50
Category
Article
ISSN
0042-207X

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