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Combined optical and X-ray interferometry for high-precision dimensional metrology

✍ Scribed by Basile, G.; Becker, P.; Bergamin, A.; Cavagnero, G.; Franks, A.; Jackson, K.; Kuetgens, U.; Mana, G.; Palmer, E. W.; Robbie, C. J.


Book ID
111916151
Publisher
The Royal Society
Year
2000
Tongue
English
Weight
710 KB
Volume
456
Category
Article
ISSN
0962-8444

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## Abstract We describe a rapid digital system for X‐ray diffraction imaging and demonstrate its application to the real‐time identification of edge defects in a silicon wafer that had been subjected to rapid thermal annealing. The application of the system to the __in situ__ study of slip nucleati