We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun
โฆ LIBER โฆ
ChemInform Abstract: Filament-Activated Chemical Vapor Deposition of Nitride Thin Films
โ Scribed by S. V. DESHPANDE; J. L. DUPUIE; E. GULARI
- Book ID
- 112038142
- Publisher
- John Wiley and Sons
- Year
- 2010
- Weight
- 27 KB
- Volume
- 27
- Category
- Article
- ISSN
- 0931-7597
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