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Chemical vapour deposition of tantalum disilicide

✍ Scribed by C. Wieczorek

Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
354 KB
Volume
126
Category
Article
ISSN
0040-6090

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πŸ“œ SIMILAR VOLUMES

The Chemical Vapour Deposition of Tantal
The Chemical Vapour Deposition of Tantalum
✍ Drs. D. J. Jerreat; Rees D. Rawlings πŸ“‚ Article πŸ“… 1974 πŸ› John Wiley and Sons 🌐 English βš– 485 KB

## Abstract The effect of the total pressure, feed temperature, deposition temperature, and reaction tube inclination and geometry on the chemical vapour deposition of tantalum from the pentaiodide has been investigated. Transport rates as high as 350 mg hr^βˆ’1^ were achieved in inclined tubes of sp

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## Abstract The paper reports the results of a structural investigation of C.V.D. tantalum, which had been deposited on a silica substrate. Deposits at 1000Β°C were high impurity powders or flakes, at 1100Β°C (normal deposition temperature) foil‐like, these containing much lower silicon contents, bei