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Chemical vapour deposition of crystalline thin films of tantalum phosphide

โœ Scribed by C.S. Blackman; C.J. Carmalt; I.P. Parkin; S.A. O'Neill; K.C. Molloy; L. Apostolico


Book ID
117357470
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
123 KB
Volume
57
Category
Article
ISSN
0167-577X

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๐Ÿ“œ SIMILAR VOLUMES


The Chemical Vapour Deposition of Tantal
โœ Drs. D. J. Jerreat; Rees D. Rawlings ๐Ÿ“‚ Article ๐Ÿ“… 1974 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 485 KB

## Abstract The effect of the total pressure, feed temperature, deposition temperature, and reaction tube inclination and geometry on the chemical vapour deposition of tantalum from the pentaiodide has been investigated. Transport rates as high as 350 mg hr^โˆ’1^ were achieved in inclined tubes of sp