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Chemical vapor deposition of tungsten step coverage and thickness uniformity experiments

โœ Scribed by Julius C. Chang


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
498 KB
Volume
208
Category
Article
ISSN
0040-6090

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Chemical vapor deposition of tungsten ox
โœ Rein U. Kirss; Lamartine Meda ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 117 KB ๐Ÿ‘ 1 views

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 ยฐC. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W