Characterization of the CH4/H2/Ar high density plasma etching process for ZnSe

✍ Scribed by C. R. Eddy; D. Leonhardt; V. A. Shamamian; J. E. Butler

• Book ID: 107452651
• Publisher: Springer US
• Year: 2001
• Tongue: English
• Weight: 156 KB
• Volume: 30
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-001-0095-y