Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

✍ Scribed by C. R. Eddy; D. Leonhardt; V. A. Shamamian; J. R. Meyer; C. A. Hoffman; J. E. Butler

• Book ID: 107458032
• Publisher: Springer US
• Year: 1999
• Tongue: English
• Weight: 497 KB
• Volume: 28
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-999-0231-7