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Characterization of piezoelectric properties of PZT thin films deposited on Si by ECR sputtering

✍ Scribed by M. Toyama; R. Kubo; E. Takata; K. Tanaka; K. Ohwada

Book ID
108028248
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
476 KB
Volume
45
Category
Article
ISSN
0924-4247

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper