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The characterization of nanocrystal graphite films deposited by ECR plasma sputtering

✍ Scribed by Ohana, T.; Nakamura, T.; Goto, A.; Tsugawa, K.; Tanaka, A.; Koga, Y.


Book ID
123549281
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
527 KB
Volume
12
Category
Article
ISSN
0925-9635

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper