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Characterization of HfO2 dielectric films with low energy SIMS

✍ Scribed by Z.X. Jiang; K. Kim; J. Lerma; D. Sieloff; H. Tseng; R.I. Hegde; T.Y. Luo; J.Y. Yang; D.H. Triyoso; P.J. Tobin

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 230 KB
Volume: 252
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.02.092

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