Ultra low energy SIMS depth profiling of sub-1.5 nm silicon oxynitride films

✍ Scribed by C.P.A. Mulcahy; B. Böck; P.A. Ebblewhite; H.P. Hebert; S. Biswas

• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 198 KB
• Volume: 252
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2006.02.226