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Atomic Layer Deposition, Characterization, and Dielectric Properties of HfO2/SiO2 Nanolaminates and Comparisons with Their Homogeneous Mixtures

✍ Scribed by L. Zhong; W. L. Daniel; Z. Zhang; S. A. Campbell; W. L. Gladfelter


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
622 KB
Volume
12
Category
Article
ISSN
0948-1907

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