In this study, we present the results of investigation on p-n GaN diodes by means of deep level transient spectroscopy (DLTS) within the temperature range of 77-350 K. Si-doped GaN layers were grown by metal-organic vapor-phase epitaxy technique (MOVPE) on the free-standing GaN substrates. Subsequen
Characterization of deep levels in n-GaN by combined capacitance transient techniques
β Scribed by Py, M. A. ;Zellweger, Ch. ;Wagner, V. ;Carlin, J.-F. ;Buehlmann, H.-J. ;Ilegems, M.
- Book ID
- 105363054
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 144 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
Deep centers in undoped nβGaN grown by Hydride Vapor Phase Epitaxy were characterized by Deep Level Transient Spectroscopy (DLTS), revealing four known levels with activation energies in the range 0.17β0.94 eV. Deeper levels in the bandgap were observed by photocapacitance (PHCAP) experiments. A correspondence can be established for the dominant DLTS level observed both by thermal and optical experiments, exploiting the temperature as a key parameter in PHCAP measurements. The FranckβCondon shift d~FβC~ for this level was estimated around 0.33 eV, in close agreement with results obtained by Hacke and coworkers in a more elaborate way. The tentative assignment of most levels is discussed on the basis of literature, pointing out unsettled origins for some of them. (Β© 2005 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
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