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Characterization of boron silicide layer deposited by ultrahigh‐vacuum chemical‐vapor deposition

✍ Scribed by Tseng, H.‐C.; Pan, F. M.; Chang, C. Y.


Book ID
111878999
Publisher
American Institute of Physics
Year
1996
Tongue
English
Weight
721 KB
Volume
80
Category
Article
ISSN
0021-8979

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