Facet formation mechanism of silicon selective epitaxial layer by Si ultrahigh vacuum chemical vapor deposition

✍ Scribed by Tohru Aoyama; Taeko Ikarashi; Keiko Miyanaga; Toru Tatsumi

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 656 KB
• Volume: 136
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(94)90438-3