Characterization of an AlN buffer layer and a thick-GaN layer grown on sapphire substrate by MOCVD
✍ Scribed by S. Çörekçi; M. K. Öztürk; A. Bengi; M. Çakmak; S. Özçelik; E. Özbay
- Publisher
- Springer
- Year
- 2010
- Tongue
- English
- Weight
- 643 KB
- Volume
- 46
- Category
- Article
- ISSN
- 0022-2461
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## Abstract This paper reports structural characterization of thick $(11\bar {2}2)$‐oriented GaN layers by means of XRD, TEM, and micro‐ CL. The semi‐polar $(11\bar {2}2)$ GaN layers were grown on __m__‐plane sapphire substrates by HVPE. Their structural quality improved with thickness. Threading d
GaN thin films have been grown on Si(001) substrate with specially designed composite intermediate layers (CIL) consisting of an ultrathin amorphous silicon layer and a GaN/Al x Ga 1± ±x N multilayered buffer by low pressure metal-organic chemical vapor deposition (MOCVD). The improved film quality