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Characterization of amorphous silicon films by Rutherford backscattering spectrometry

✍ Scribed by K. Kubota; T. Imura; M. Iwami; A. Hiraki; M. Satou; F. Fujimoto; Y. Hamakawa; S. Minomura; K. Tanaka

No coin nor oath required. For personal study only.

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