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Characterization of air-exposed surface of β-FeSi2 fabricated by ion beam sputter deposition method

✍ Scribed by T. Saito; H. Yamamoto; K. Yamaguchi; T. Nakanoya; K. Hojou; M. Haraguchi; M. Imamura; N. Matsubayashi; T. Tanaka; H. Shimada

Book ID
114167086
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
126 KB
Volume
206
Category
Article
ISSN
0168-583X

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✍ M. Sasase; K. Shimura; K. Yamaguchi; H. Yamamoto; S. Shamoto; K. Hojou 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 643 KB

Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese