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Effect of surface treatment of Si substrate on the crystal structure of FeSi2 thin film formed by ion beam sputter deposition method

โœ Scribed by M. Haraguchi; H. Yamamoto; K. Yamaguchi; T. Nakanoya; T. Saito; M. Sasase; K. Hojou

Book ID
114167084
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
153 KB
Volume
206
Category
Article
ISSN
0168-583X

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Beta iron disilicide (b-FeSi 2 ) is one of the candidate materials for a compound semiconductor, which is promising for optoelectronic devices. b-FeSi 2 film has been obtained by ion beam sputter deposition (IBSD) on Si(1 0 0) substrates that are pre-treated by sputter etching by Ne + . In the prese