Characterization in Silicon Processing

✍ Scribed by Strausser, Yale

Publisher: Elsevier
Year: 1993
Tongue: English
Leaves: 249
Category: Library

No coin nor oath required. For personal study only.

✦ Synopsis

This book reviews techniques by which silicon processing engineers working with semiconductors can meet the demands for improved material quality and performance made necessary by increasingly stringent requirements, such as decreasing barrier film thicknesses. Among the techniques described are monitoring the effectiveness of surface cleaning processes; determining the amount of silicon consumption during barrier film and silicide growth; and silicon selective epitaxial growth.

✦ Table of Contents

Content:
• Front Matter
• Preface to Series
• Preface
• Table of Contents
1. Application of Materials Characterization Techniques to Silicon Epitaxial Growth
2. Polysilicon Conductors
3. Silicides
4. Aluminum- and Copper-Based Conductors
5. Tungsten-Based Conductors
6. Barrier Films
Appendix: Technique Summaries
• Index

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