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Characterization by spectroscopic ellipsometry of buried layer structures in silicon formed by ion beam synthesis

✍ Scribed by Jan Vanhellemont; Philippe Roussel


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
618 KB
Volume
12
Category
Article
ISSN
0921-5107

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Silicon oxynitride (Si x O y N z ) buried insulating layers were synthesized by SIMNOX (separation by implanted nitrogen-oxygen) process by 14 N + and 16 O + ion implantation to high fluence levels 1 β€’ 10 17 , 2.5 β€’ 10 17 and 5 β€’ 10 17 ions cm Γ€2 sequentially in the ratio 1:1 at 150 keV into p-type