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Characteristics of WN Diffusion Barrier Layer for Copper Metallization

✍ Scribed by Kwak, M. Y. ;Shin, D. H. ;Kang, T. W. ;Kim, K. N.


Publisher
John Wiley and Sons
Year
1999
Tongue
English
Weight
96 KB
Volume
174
Category
Article
ISSN
0031-8965

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In this paper the investigation of r.f.-sputter-deposited Ta, Ta-N and Ta-N-O thin Ðlms is presented. Using atomic force microscopy in combination with sheet resistance measurements, Auger electron spectroscopy and x-ray diffraction, the thin Ðlm properties and microstructure are examined. Two cryst